Industries
Semiconductor
Wet process chemistry is specified tightly and measured on a schedule. Paeonia was founded out of A*STAR's Institute of Microelectronics, so fab-side measurement is familiar ground.
The problem
Wet process chemistry drifts as baths are used and replenished. The bath is titrated on a schedule, which means the concentration is known at the moment of sampling and estimated the rest of the time. Replacement is scheduled conservatively, because the cost of running out of specification is a wafer lot.
Where it bites
Concentration monitoring
Continuous bath composition instead of scheduled titration.
Learn morePurity monitoring
Detect contamination while the bath is still usable.
Learn morePump–probe & ultrafast
Carrier dynamics and thermal transport in materials characterisation.
Learn moreDistance & thickness metrology
Thin-film and layer thickness from a comb source.
Learn moreTrace gas detection
High-resolution absorption for process gas.
Learn moreWhat suits a fab environment
- A 5 × 5.5 × 6 cm instrument drawing 600 mW over one USB-C cable fits where a rack-mounted analyser does not.
- Control over OPC UA, so the reading becomes a process input rather than a report.
- The software runs locally with no internet connection required, and installation can follow your corporate IT policy.
- pH 2–10 on stainless steel wetted parts, with Hastelloy available for aggressive chemistry.
Tell us the measurement you cannot make today
Describe the stream, the chemistry and the decision it blocks. Where it makes sense we test the technology on your own process samples before you commit.